19. maijs | Andreas Stamm

Plasma Processing for dry etching and deposition

Andreas Stamm (Oxford Instruments/ Plasma Technology) The talk gives an overview about different ways to use a cold plasma for applications in micro- and nanoelectronics like

• Dry Etching RIE / ICP – RIE/ ALE
• Plasma Deposition PECVD
• Magnetron Sputtering
• Atomic Layer Deposition ALD
• Ion Beam Etching and Deposition
• the growth of 1d and 2d materials

Many example applications will be shown.